CovCircuit Boardyog zoo li ib tug complex thiab meej kev thauj mus los hauv nroog network, txuas ntau yam khoom siv hluav taws xob hauv kev ua kom muaj kev ruaj ntseg ntawm cov khoom siv. Txoj kev loj hlob ntawm Circuit Court boards, raws li ib tug tseem ceeb txuas nyob rau hauv lub manufacturing txheej txheem ntawm Circuit Court boards, yog ib qho tseem ceeb heev.
Txoj kev loj hlob
Txoj kev loj hlob ntawm Circuit Court boards yog raws li lub hauv paus ntsiab lus ntawm photochemical tshuaj. Thaum ua Circuit Court boards, ib txheej ntawm photosensitive cov ntaub ntawv, xws li qhuav zaj duab xis los yog ntub zaj duab xis photoresist, yog thawj uniformly coated rau saum npoo ntawm tooj liab- clad laminate. Cov photoresists no rhiab heev rau cov wavelengths ntawm lub teeb, zoo li lawv tau muab "photoresponsive hloov". When a mask with circuit patterns is covered on the photoresist layer and exposed to ultraviolet light, the photoresist in the transparent area of the mask undergoes photopolymerization reaction, and the molecular structure changes from being soluble in the developer solution to being insoluble. Thiab nyob rau hauv cov cheeb tsam tsis raug rau lub teeb, lub photoresist tseem khaws solubility. Tom qab ntawd, lub Circuit Court board yog immersed nyob rau hauv ib tug tsim tawm kev daws teeb meem, thiab unexposed photoresist yog yaj thiab tshem tawm, tso cai rau lub Circuit Court qauv kom meej meej qhia rau saum npoo ntawm tooj liab- clad board, zoo li lub teeb ci ci nyob rau hauv qhov tsaus ntuj, illuminating lub layout txheej txheem ntawm lub Circuit Court.
Txoj kev loj hlob
kev npaj
Ua ntej kev tsim kho, nws yog ib qho tsim nyog los xyuas kom meej tias tag nrho cov khoom siv thiab cov cuab yeej siv tau zoo. Xyuas seb hom, concentration, thiab qhov kub thiab txias ntawm kev tsim cov tshuaj puas ua tau raws li cov txheej txheem. Ntau hom photoresists sib haum rau cov yam ntxwv sib txawv ntawm kev tsim cov kev daws teeb meem, xws li alkaline tsim cov kev daws teeb meem uas feem ntau siv los tsim cov yeeb yaj kiab qhuav photoresists. Nyob rau tib lub sijhawm, kev tu thiab kev debugging yuav tsum tau ua los ntawm kev tsim cov khoom siv, xws li tshuaj tsuag lossis immersion tsim cov cav tov, kom ntseeg tau tias kev ua haujlwm ruaj khov ntawm cov cuab yeej thiab kev sib koom ua ke ntawm cov khoom xws li kev sib kis thiab cov tshuaj tsuag.
Txhim kho kev ua haujlwm
Smoothly pub rau lub rooj tsav xwm raug tawm mus rau hauv lub tshuab tsim. Hauv kev tsim cov tshuaj tsuag, qhov siab - lub siab lub taub hau sib npaug thiab quab yuam cov neeg tsim tawm mus rau saum npoo ntawm lub rooj tsav xwm Circuit Court, thiab tus tsim tawm sai sai los rau hauv kev sib cuag nrog cov photoresist tsis pom thiab dhau los ua cov tshuaj tiv thaiv tawg. Raws li lub rooj tsav xwm hauv Circuit Court txav, tag nrho saum npoo yog ntxuav ib qho los ntawm ib qho, thiab cov qauv hauv Circuit Court maj mam ua kom pom tseeb. Immersion txoj kev loj hlob yog cov txheej txheem ntawm tag nrho immersing lub Circuit Court board rau hauv lub tank uas muaj cov tsim tawm kev daws teeb meem, thiab stirring nws tsim nyog los xyuas kom meej tias tus tsim tawm kev daws teeb meem tag nrho ua rau lub photoresist thiab dissolves unexposed feem. Hauv cov txheej txheem no, kev tswj xyuas meej ntawm lub sijhawm txhim kho yog qhov tseem ceeb. Yog hais tias lub sij hawm luv luv, qhov tsis muaj photoresist residue yuav tshwm sim, uas yuav ua rau muaj teeb meem xws li luv luv circuits; Yog hais tias lub sij hawm ntev dhau lawm, cov ntug photoresist raug eroded ntau dhau, ua rau lub voj voog ua thinner los yog qhib Circuit Court.
Yaug thiab qhuav
Tom qab kev txhim kho tiav, muaj cov residual developer tov thiab yaj photoresist impurities nyob rau saum npoo ntawm Circuit Court board. Nws yog ib qho tsim nyog yuav tsum yaug tam sim ntawd nrog dej ntau kom huv si tshem tawm cov khoom seem thiab tiv thaiv lawv kom tsis txhob muaj kev cuam tshuam tsis zoo rau cov txheej txheem tom ntej. Tom qab yaug, cov dej noo ntawm lub rooj tsavxwm raug tshem tawm los ntawm kev siv cov txheej txheem xws li cua kub kom qhuav lossis lub tshuab nqus tsev kom qhuav, kom lub rooj tsavxwm hauv Circuit Court nkag mus rau cov txheej txheem tsim khoom tom ntej hauv lub xeev qhuav thiab huv, nteg lub hauv paus zoo rau etching, electroplating thiab lwm yam txheej txheem.
Yam tseem ceeb cuam tshuam rau kev loj hlob
Developer parameters
Qhov concentration, kub, thiab pH tus nqi ntawm tus tsim tawm muaj qhov cuam tshuam loj rau kev loj hlob. Cov concentration ntau dhau thiab kev loj hlob sai sai tuaj yeem ua rau cov npoo tsis zoo thiab kev loj hlob ntau dhau ntawm lub voj voog; Tsawg concentration, qeeb kev loj hlob ceev, thiab ua tsis tiav kev loj hlob. Kub yog qhov tseem ceeb sib npaug. Raws li qhov kub thiab txias, qhov kev loj hlob ntawm cov tshuaj tiv thaiv tau nrawm dua, tab sis qhov kub thiab txias heev tuaj yeem ua rau cov photoresist nthuav dav thiab deform, cuam tshuam qhov tseeb; Qhov ntsuas kub tsawg dhau, ua rau muaj kev txhim kho qis. Tus nqi pH kuj yuav tsum tau tswj nruj me ntsis. Cov photoresists sib txawv muaj cov cai tshwj xeeb rau pH tus nqi ntawm cov kev daws teeb meem, thiab kev sib txawv ntawm qhov tsim nyog tuaj yeem ua rau kev loj hlob txawv txav.
Kev pom zoo
Cov txheej txheem raug txiav txim siab lub xeev polymerization ntawm photoresist thiab yog ib qho tseem ceeb ua ntej rau kev txhim kho cov nyhuv. Lub zog tsis txaus, tsis tiav polymerization ntawm photoresist, yooj yim detachment thaum lub sij hawm kev loj hlob, ua rau tsis muaj circuits; Kev tawm dag zog ntau dhau, ntau dhau ntawm polymerization ntawm photoresist, nyuaj hauv kev txhim kho, thiab txawm tias muaj peev xwm ua tsis tiav. Tsis tas li ntawd, cov yam ntxwv xws li kev sib raug zoo thiab teeb pom kev zoo sib xws thaum lub sij hawm raug cuam tshuam tuaj yeem cuam tshuam ncaj qha rau qhov raug thiab meej ntawm cov qauv Circuit Court, yog li cuam tshuam rau kev loj hlob.
Cov cuab yeej ua haujlwm
Qhov kev ua tau zoo ntawm kev tsim cov khoom siv ncaj qha cuam tshuam rau kev txhim kho zoo. Lub nozzle siab, lub kaum sab xis, thiab kev pab cuam ntau yam ntawm cov tshuaj tsuag hom tsim tshuab txiav txim siab qhov sib xws ntawm kev faib cov tshuaj tsim tawm ntawm qhov chaw ntawm lub rooj tsav xwm Circuit Court; Txoj kev nplawm thiab kev siv ntawm immersion tsim tshuab cuam tshuam cov tshuaj tiv thaiv kev ua haujlwm ntawm kev tsim cov tshuaj thiab photoresist. Kev ruaj ntseg ntawm cov khoom siv tsis tuaj yeem raug ignored. Yog hais tias lub rooj tsav xwm Circuit Court co co los yog khov thaum lub sij hawm txoj kev loj hlob, nws yuav ua rau txoj kev loj hlob tsis sib xws thiab cuam tshuam rau qhov zoo ntawm cov qauv Circuit Court.